Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis

Summary, in English

Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65% higher PEC performance and 2.3 mA/cm² higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.

• Author: Axl Eriksson; Anurag Kawde; Lukas Hrachowina; Sarah R. McKibbin; Qi Shi; Magnus T. Borgström; Thomas Wågberg; Tönu Pullerits; Jens Uhlig
• Department/s: LU Profile Area: Light and Materials; LTH Profile Area: Nanoscience and Semiconductor Technology; Chemical Physics; NanoLund: Centre for Nanoscience; LTH Profile Area: Photon Science and Technology; LINXS - Institute of advanced Neutron and X-ray Science; Solid State Physics; eSSENCE: The e-Science Collaboration
• Publishing year: 2024
• Language: English
• Pages: 20623-20628
• Publication/Series: ACS Omega
• Volume: 9
• Issue: 18
• Links: http://dx.doi.org/10.1021/acsomega.4c03039
• Document type: Journal article
• Publisher: The American Chemical Society (ACS)
• Topic: Condensed Matter Physics (including Material Physics, Nano Physics); Atom and Molecular Physics and Optics; Nano-technology
• Status: Published
• ISBN/ISSN/Other: ISSN: 2470-1343